Chin. J. Semicond. > 1991, Volume 12 > Issue 4 > 224-230
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共溅射W-Si薄膜的快速热退火及其热氧化研究

陈存礼 , 李建年 and 华文玉

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    Received: 19 August 2015 Revised: Online: Published: 01 April 1991

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      Article Navigation >  Journal of Semiconductors  > 1991  >  12(4): 224-230
      陈存礼, 李建年, 华文玉. 共溅射W-Si薄膜的快速热退火及其热氧化研究[J]. 半导体学报(英文版), 1991, 12(4): 224-230.
      Citation:
      陈存礼, 李建年, 华文玉. 共溅射W-Si薄膜的快速热退火及其热氧化研究[J]. 半导体学报(英文版), 1991, 12(4): 224-230.
      shu

      • Received Date: 2015-08-19

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