Chin. J. Semicond. > 2002, Volume 23 > Issue 7 > 701-706
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基于规则的光学邻近矫正中规则的相关处理(英文)

石蕊 , 蔡懿慈 , 洪先龙 , 吴为民 and 杨长旗

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Key words: 光刻, 光学邻近矫正, 规则库

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    Received: 19 August 2015 Revised: Online: Published: 01 July 2002

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      Article Navigation >  Journal of Semiconductors  > 2002  >  23(7): 701-706
      石蕊, 蔡懿慈, 洪先龙, 吴为民, 杨长旗. 基于规则的光学邻近矫正中规则的相关处理(英文)[J]. 半导体学报(英文版), 2002, 23(7): 701-706.
      Citation:
      石蕊, 蔡懿慈, 洪先龙, 吴为民, 杨长旗. 基于规则的光学邻近矫正中规则的相关处理(英文)[J]. 半导体学报(英文版), 2002, 23(7): 701-706.
      shu

      • Received Date: 2015-08-19

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