Chin. J. Semicond. > 1997, Volume 18 > Issue 8 > 587-591
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借助硅片减薄重掺硅间隙氧含量低温(10K)红外测量

王启元 , 王俊 , 韩秀峰 , 邓惠芳 , 王建华 , 昝育德 , 蔡田海 , 郁元桓 and 林兰英

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    Received: 19 August 2015 Revised: Online: Published: 01 August 1997

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      Article Navigation >  Journal of Semiconductors  > 1997  >  18(8): 587-591
      王启元, 王俊, 韩秀峰, 邓惠芳, 王建华, 昝育德, 蔡田海, 郁元桓, 林兰英. 借助硅片减薄重掺硅间隙氧含量低温(10K)红外测量[J]. 半导体学报(英文版), 1997, 18(8): 587-591.
      Citation:
      王启元, 王俊, 韩秀峰, 邓惠芳, 王建华, 昝育德, 蔡田海, 郁元桓, 林兰英. 借助硅片减薄重掺硅间隙氧含量低温(10K)红外测量[J]. 半导体学报(英文版), 1997, 18(8): 587-591.
      shu

      • Received Date: 2015-08-19

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