Chin. J. Semicond. > 1995, Volume 16 > Issue 9 > 700-705
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Si~＋、As~＋双离子注入半绝缘GaAs的研究

王永晨，刘明成，叶维祎，王玉芳，赵杰

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    Received: 19 August 2015 Revised: Online: Published: 01 September 1995

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      Article Navigation >  Journal of Semiconductors  > 1995  >  16(9): 700-705
      王永晨，刘明成，叶维祎，王玉芳，赵杰. Si~＋、As~＋双离子注入半绝缘GaAs的研究[J]. 半导体学报(英文版), 1995, 16(9): 700-705.
      Citation:
      王永晨，刘明成，叶维祎，王玉芳，赵杰. Si~＋、As~＋双离子注入半绝缘GaAs的研究[J]. 半导体学报(英文版), 1995, 16(9): 700-705.
      shu

      • Received Date: 2015-08-19

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