Abstract: Nanometer thin film strain resistance is manufactured directly on the metallic elastic substrate by ion-beam sputtering technology and semiconductor micro-machining technology, Which achieve atomic union betWeen sensitive element and elastic substrate. This effectively solves the technical problem about Nzero drift H of the traditional pressure sensors, and makes pressure sensors be stable and reliable for long-term on condition of harsh environment, such as high temperature and vibration and so on.

Key words: nanometer thin film,  ion-beam sputtering,  pressure sensors,  long-term stability