Chin. J. Semicond. > 2007, Volume 28 > Issue 11 > 1748-1755

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Molecular Dynamic Simulation of the Interaction Between a Low EnergyBombarding Si Atoms and the Si(001) 2×1 Reconstructed Surface

Zhu Linshan, Jin Shisheng, Gou Fujun and Xie Quan

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Abstract: Molecular dynamic simulations are performed to investigate the microscopic process when a Si atom with an incident energy of 0.03eV bombards a Si(001) 2×1 reconstructed surface at 300K using the Tersoff potential.Six different bombarding sites are chosen in order to study the interaction between the bombarding Si atom and substrate surface atoms.We map the bombarding Si atom’s kinetic energy,potential energy and trajectory.The results show that the interaction between the bombarding Si atom and the substrate surface atoms completes in a few picoseconds.The max binding energy of an adatom to a Si(001) 2×1 reconstructed surface is about 2.99eV.A single,0.03eV incident Si atom can open a surface dimer in dozens of femtoseconds after the interaction takes place from positions 5 or 6,while the atom bombarded from positions 1,2,3,4 cannot.

Key words: molecular dynamicsdimerTersoff potentialpotential energy

1

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2

An 88 nm gate-length In0.53Ga0.47As/In0.52Al0.48As InP-based HEMT with fmax of 201 GHz

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Journal of Semiconductors, 2012, 33(7): 074004. doi: 10.1088/1674-4926/33/7/074004

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High breakdown voltage InGaAs/InP double heterojunction bipolar transistors with fmax = 256 GHz and BVCEO = 8.3 V

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Ultra high-speed InP/InGaAs SHBTs with ft and fmax of 185 GHz

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7

Ultra High-Speed InP/InGaAs SHBTs with ft of 210GHz

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Journal of Semiconductors, 2008, 29(3): 414-417.

8

A Submicron InGaAs/InP Heterojunction Bipolar Transistor with ft of 238GHz

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9

A New Method for InGaAs/InP Composite ChannelHEMTs Simulation

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Chinese Journal of Semiconductors , 2007, 28(11): 1706-1711.

10

Effect of Deep Traps in Carrier Generation and Transport in Undoped InP Wafers

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Chinese Journal of Semiconductors , 2007, 28(S1): 24-27.

11

Growth and characterization of InP-based and phosphorous-involved materials for applications to HBTs by GSMBE were studied systematically. High quality 50ram InP-based HBT and 100mm InGaP/GaAs HBT epitaxial materials were obtained through optimizing the HBT structure design and the GSMBE growth condition. It is shown that the HBT devices and circuits with high performance can be achieved by using the epi-wafers grown by the GSMBE technology developed in this work.

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12

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13

Growth Modes of InP Epilayers Grown by Solid Source Molecular Beam Epitaxy

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14

InP/InGaAs Heterojunction Bipolar Transistor with Base μ-Bridge and Emitter Air-Bridge

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Agilent HBT Model Parameters Extraction Procedure For InP HBT’

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16

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17

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18

A 162GHz Self-Aligned InP/InGaAs Heterojunction Bipolar Transistor

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19

Activation of Fe Doping and Electrical Compensation in Semi-Insulating InP

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Chinese Journal of Semiconductors , 2006, 27(11): 1934-1939.

20

Synthesis and Spectral Properties of InP Colloidal Quantum Dots

Zhang Daoli, Zhang Jianbing, Wu Qiming, Yuan Lin, Chen Sheng, et al.

Chinese Journal of Semiconductors , 2006, 27(7): 1213-1216.

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    Su Shubing, Liu Xunchun, Liu Xinyu, Yu Jinyong, Wang Runmei, Xu Anhuai, Qi Ming. Performance of a Self-Aligned InP/GaInAs SHBT with a Novel T-Shaped Emitter[J]. Journal of Semiconductors, 2006, 27(3): 434-437.
    Su S B, Liu X C, Liu X Y, Yu J Y, Wang R M, Xu A H, Qi M. Performance of a Self-Aligned InP/GaInAs SHBT with a Novel T-Shaped Emitter[J]. Chin. J. Semicond., 2006, 27(3): 434.
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    Received: 18 August 2015 Revised: 05 July 2007 Online: Published: 01 November 2007

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      Su Shubing, Liu Xunchun, Liu Xinyu, Yu Jinyong, Wang Runmei, Xu Anhuai, Qi Ming. Performance of a Self-Aligned InP/GaInAs SHBT with a Novel T-Shaped Emitter[J]. Journal of Semiconductors, 2006, 27(3): 434-437. ****Su S B, Liu X C, Liu X Y, Yu J Y, Wang R M, Xu A H, Qi M. Performance of a Self-Aligned InP/GaInAs SHBT with a Novel T-Shaped Emitter[J]. Chin. J. Semicond., 2006, 27(3): 434.
      Citation:
      Zhu Linshan, Jin Shisheng, Gou Fujun, Xie Quan. Molecular Dynamic Simulation of the Interaction Between a Low EnergyBombarding Si Atoms and the Si(001) 2×1 Reconstructed Surface[J]. Journal of Semiconductors, 2007, 28(11): 1748-1755. ****
      Zhu L S, Jin S S, Gou F J, Xie Q. Molecular Dynamic Simulation of the Interaction Between a Low EnergyBombarding Si Atoms and the Si(001) 2×1 Reconstructed Surface[J]. Chin. J. Semicond., 2007, 28(11): 1748.

      Molecular Dynamic Simulation of the Interaction Between a Low EnergyBombarding Si Atoms and the Si(001) 2×1 Reconstructed Surface

      • Received Date: 2015-08-18
      • Accepted Date: 2007-04-16
      • Revised Date: 2007-07-05
      • Published Date: 2007-10-24

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