Chin. J. Semicond. > 2004, Volume 25 > Issue 10 > 1273-1276
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高温快速热处理对氧沉淀消融的作用

林磊 , 杨德仁 , 马向阳 , 李立本 and 阙端麟

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Key words: 快速热处理, 氧沉淀, 直拉硅单晶

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    Received: 19 August 2015 Revised: Online: Published: 01 October 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(10): 1273-1276
      林磊, 杨德仁, 马向阳, 李立本, 阙端麟. 高温快速热处理对氧沉淀消融的作用[J]. 半导体学报(英文版), 2004, 25(10): 1273-1276.
      Citation:
      林磊, 杨德仁, 马向阳, 李立本, 阙端麟. 高温快速热处理对氧沉淀消融的作用[J]. 半导体学报(英文版), 2004, 25(10): 1273-1276.
      shu

      • Received Date: 2015-08-19

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