J. Semicond. > 2009, Volume 30 > Issue 3 > 034010

SEMICONDUCTOR DEVICES

Sensitive properties of In-based compound semiconductor oxide to Cl2 gas

Zhao Wenjie, Shi Yunbo, Xiu Debin, Lei Tingping, Feng Qiaohua and Wang Liquan

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DOI: 10.1088/1674-4926/30/3/034010

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Abstract: Aiming at detecting Clgas, this study was made on how to make In-based compound semiconductor oxide gas sensor. The micro-property and sensitivity of In-based gas sensing material were analyzed and its gas sensitive mechanism was also discussed. Adopting constant temperature chemical coprecipitation, the compound oxides such as In–Nb, In–Cd and In–Mg were synthesized, respectively. The products were sintered at 600 ℃ and characterized by the Scanning Electron Microscope (SEM), showing the grain size almost about 50–60 nm. The test results show that the sensitivities of In–Nb, In–Cd and In–Mg materials under the concentration of 50 × 10-6 in Clgas are above 100 times, 4 times and 10 times, respectively. The response time of In–Nb, In–Cd and In–Mg materials is about 30, 60 and 30 s, and the recovery time less than 2, 10 and 2 min, respectively. Among them, the In–Nb material was found to have a relatively high conductivity and ideal sensitivity to Cl2 gas, which showed rather good selectivity and stability, and could detect the minimum concentration of 0.5 × 10-6 with the sensitivity of 2.2, and the upper limit concentration of 500 × 10-6. The power loss of the device is around 220 mW under the heating voltage of 3 V.

Key words: In2O3 Nb2O5 sensitive property chlorine gas sensor

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    Received: 18 August 2015 Revised: 06 October 2008 Online: Published: 01 March 2009

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      Zhao Wenjie, Shi Yunbo, Xiu Debin, Lei Tingping, Feng Qiaohua, Wang Liquan. Sensitive properties of In-based compound semiconductor oxide to Cl2 gas[J]. Journal of Semiconductors, 2009, 30(3): 034010. doi: 10.1088/1674-4926/30/3/034010 ****Zhao W J, Shi Y B, Xiu D B, Lei T P, Feng Q H, Wang L Q. Sensitive properties of In-based compound semiconductor oxide to Cl2 gas[J]. J. Semicond., 2009, 30(3): 034010. doi:  10.1088/1674-4926/30/3/034010.
      Citation:
      Zhao Wenjie, Shi Yunbo, Xiu Debin, Lei Tingping, Feng Qiaohua, Wang Liquan. Sensitive properties of In-based compound semiconductor oxide to Cl2 gas[J]. Journal of Semiconductors, 2009, 30(3): 034010. doi: 10.1088/1674-4926/30/3/034010 ****
      Zhao W J, Shi Y B, Xiu D B, Lei T P, Feng Q H, Wang L Q. Sensitive properties of In-based compound semiconductor oxide to Cl2 gas[J]. J. Semicond., 2009, 30(3): 034010. doi:  10.1088/1674-4926/30/3/034010.

      Sensitive properties of In-based compound semiconductor oxide to Cl2 gas

      DOI: 10.1088/1674-4926/30/3/034010
      • Received Date: 2015-08-18
      • Accepted Date: 2008-08-18
      • Revised Date: 2008-10-06
      • Published Date: 2009-03-12

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