Citation: |
Zebao Du, Hao Yang, Haiying Zhang, Min Zhu. An integrated power divider implemented in GaAs technology[J]. Journal of Semiconductors, 2014, 35(4): 045003. doi: 10.1088/1674-4926/35/4/045003
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Z B Du, H Yang, H Y Zhang, M Zhu. An integrated power divider implemented in GaAs technology[J]. J. Semicond., 2014, 35(4): 045003. doi: 10.1088/1674-4926/35/4/045003.
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An integrated power divider implemented in GaAs technology
DOI: 10.1088/1674-4926/35/4/045003
More Information
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Abstract
A compact lumped integrated power divider with low insertion loss using 0.5 μm GaAs pHEMT technology is presented. The proposed power divider uses the π-type LC network for transmission line equivalence and a thin film resistor for isolation tuning simultaneously. The quality factor of the inductor is analyzed and synthesized for insertion-loss influence. The measured insertion loss is less than 0.5 dB when the operating frequency is within the range of 5.15-6.15 GHz. The return loss and isolation are better than 15 dB and 20 dB, respectively. The compact dimension of the power divider is as small as 0.9×0.85 mm2. The measured results agree well with the simulated ones.-
Keywords:
- power divider,
- GaAs,
- IPD
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References
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