Citation: |
Weinan Dai, Jing Zhu, Weifeng Sun, Yicheng Du, Keqin Huang. An improved trench gate super-junction IGBT with double emitter[J]. Journal of Semiconductors, 2015, 36(1): 014009. doi: 10.1088/1674-4926/36/1/014009
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W N Dai, J Zhu, W F Sun, Y C Du, K Q Huang. An improved trench gate super-junction IGBT with double emitter[J]. J. Semicond., 2015, 36(1): 014009. doi: 10.1088/1674-4926/36/1/014009.
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An improved trench gate super-junction IGBT with double emitter
DOI: 10.1088/1674-4926/36/1/014009
More Information
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Abstract
An improved trench gate super-junction insulated-gate bipolar transistor is presented. The improved structure contains two emitter regions. The first emitter region of the device works as the conventional structure, which can absorb both the electron current and hole current. The second emitter on the top of the p-pillar acts as the hole current diverter, leading to an improved latch-up capability without sacrificing the off-state breakdown voltage (BV) and turn-off loss. The simulation shows that the latch-up limit of the SJ-IGBT increases from 15000 to 28300 A/cm2 at VGE = 10 V, the BV is 810 V, and the turn off loss is 6.5 mJ/cm2 at Von = 1.2 V. -
References
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