1. Introduction
Electrostatic discharge (ESD) remains a significant reliability concern as the semiconductor industry develops, and this issue is intensified when the critical dimension enters nanometer scale. The diode-triggered silicon-controlled rectifier (DTSCR) is widely applied in ESD protection schemes for advanced complementary metal-oxide semiconductor (CMOS) process due to its many advantages over the diode string, silicon-controlled rectifier (SCR), grounded-gate n-type metal-oxide semiconductor (gg-nMOS) etc. For example, it has the adjustable trigger/holding voltage to meet different I/O requirements, and a low parasitic capacitance about half that of a single diode[1-14].However, it has an undesirable multiple-triggering effect, which causes a larger overall trigger voltage and reduced ESD safe margin. The related research has been performed to investigate underlying physics and the higher current level required in the intrinsic SCR is the major reason. It seems that the multiple-triggering effect is attributed to the current division between the intrinsic and parasitic SCR[15].In this letter, putting a large space in the trigger diodes of the typical DTSCR is proposed to get a deeper insight into this puzzle and the triggering current is observed to decrease along with the enlarged space. This phenomenon proves that the current division between the intrinsic and parasitic SCR is dominating the multiple triggering effect. Necessary device simulation and transmission line pulse (TLP) test are performed to confirm this discussion. In addition, the modified DTSCR device structures achieve a reduced overall trigger voltage, which indicates a minimized multiple triggering effect.
2. Device structure description
The cross-section, equivalent circuit and layout top view of the modified DTSCR device structure is depicted in Fig. 1, which is characterized by a large space between the trigger diodes D1 and D2. The resistance in the intrinsic and parasitic SCR paths is named as
3. Device simulation analysis
TCAD tools are used to investigate this operating physics and illustrate the turn-on process of the DTSCR structures. The simulated DTSCR device structures are named device structure (a) (the typical one), (b) and (c) with the space of 2.5, 7.5 and 13.5

It can be observed that the three device structures follow the identical physical process: only the diode chain is open @ 0.01 mA/
Fig. 3 shows the terminal current versus time curves of the device structure (a) procured at 100 ns under the pulse of 0.6 mA/
Fig. 4 exhibits the current variation in the intrinsic and parasitic SCR routines along with the linearly increased space between the D1 and D2 diode. The improved
4. TLP test results
In Fig. 5, it can be observed that the triggering current is reduced in regularity from device structure (a) to (c). Due to the improved parasitic resistance, the trigger voltage at the second snapback is reduced at first and then increased. Obviously, the measuring results are in good agreement with the above analysis. Compared with the typical DTSCR (device structure (a)), the modified structures (device structure (b) and (c)) achieve the minimized multiple triggering effect.
5. Conclusion
A deeper insight into the underlying physics behind the multiple-triggering effect in DTSCRs is presented in this paper. Inserting large space in the trigger diodes is proposed to investigate the current division law between the intrinsic and parasitic SCR. Through device simulations and TLP test, it is summarized that the triggering current is reduced as the parasitic SCR resistance increases and the multiple triggering effect is the comprehensive result of the parasitic resistance and triggering current. In addition, the modified DTSCR device structures with larger space between trigger diodes can obtain the minimized multiple triggering effect.