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J. Semicond. > 2017, Volume 38 > Issue 7 > 075001

SEMICONDUCTOR INTEGRATED CIRCUITS

Insight into multiple-triggering effect in DTSCRs for ESD protection

Lizhong Zhang, Yuan Wang, Yize Wang and Yandong He

+ Author Affiliations

 Corresponding author: Yuan Wang, E-mail:wangyuan@pku.edu.cn; Yandong He, E-mail:heyd@pku.edu.cn

DOI: 10.1088/1674-4926/38/7/075001

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Abstract: The diode-triggered silicon-controlled rectifier (DTSCR) is widely used for electrostatic discharge (ESD) protection in advanced CMOS process owing to its advantages, such as design simplification, adjustable trigger/holding voltage, low parasitic capacitance. However, the multiple-triggering effect in the typical DTSCR device may cause undesirable larger overall trigger voltage, which results in a reduced ESD safe margin. In previous research, the major cause is attributed to the higher current level required in the intrinsic SCR. The related discussions indicate that it seems to result from the current division rule between the intrinsic and parasitic SCR formed in the triggering process. In this letter, inserting a large space into the trigger diodes is proposed to get a deeper insight into this issue. The triggering current is observed to be regularly reduced along with the increased space, which confirms that the current division is determined by the parasitic resistance distributed between the intrinsic and parasitic SCR paths. The theoretical analysis is well confirmed by device simulation and transmission line pulse (TLP) test results. The reduced overall trigger voltage is achieved in the modified DTSCR structures due to the comprehensive result of the parasitic resistance vs triggering current, which indicates a minimized multiple-triggering effect.

Key words: electrostatic discharge (ESD)diode-triggered silicon-controlled rectifier (DTSCR)double snapbacktransmission line pulse (TLP) test

Electrostatic discharge (ESD) remains a significant reliability concern as the semiconductor industry develops, and this issue is intensified when the critical dimension enters nanometer scale. The diode-triggered silicon-controlled rectifier (DTSCR) is widely applied in ESD protection schemes for advanced complementary metal-oxide semiconductor (CMOS) process due to its many advantages over the diode string, silicon-controlled rectifier (SCR), grounded-gate n-type metal-oxide semiconductor (gg-nMOS) etc. For example, it has the adjustable trigger/holding voltage to meet different I/O requirements, and a low parasitic capacitance about half that of a single diode[1-14].However, it has an undesirable multiple-triggering effect, which causes a larger overall trigger voltage and reduced ESD safe margin. The related research has been performed to investigate underlying physics and the higher current level required in the intrinsic SCR is the major reason. It seems that the multiple-triggering effect is attributed to the current division between the intrinsic and parasitic SCR[15].In this letter, putting a large space in the trigger diodes of the typical DTSCR is proposed to get a deeper insight into this puzzle and the triggering current is observed to decrease along with the enlarged space. This phenomenon proves that the current division between the intrinsic and parasitic SCR is dominating the multiple triggering effect. Necessary device simulation and transmission line pulse (TLP) test are performed to confirm this discussion. In addition, the modified DTSCR device structures achieve a reduced overall trigger voltage, which indicates a minimized multiple triggering effect.

The cross-section, equivalent circuit and layout top view of the modified DTSCR device structure is depicted in Fig. 1, which is characterized by a large space between the trigger diodes D1 and D2. The resistance in the intrinsic and parasitic SCR paths is named as Rx and Ry, respectively. When the space between D1 and D2 is increased, Rx is constant but Ry is accordingly improved. Considering the identical potential barrier distributed between the typical and modified structures, the latter one requires less current to trigger in both the intrinsic and parasitic SCRs.

Figure  1.  (a) The cross-section, (b) equivalent circuit, (c) and layout top view of the modified DTSCR structure with a large space between the trigger diodes D1 and D2.

TCAD tools are used to investigate this operating physics and illustrate the turn-on process of the DTSCR structures. The simulated DTSCR device structures are named device structure (a) (the typical one), (b) and (c) with the space of 2.5, 7.5 and 13.5 μm between the trigger diodes D1 and D2. Pulses with amplitude of 0.01, 0.6, and 2 mA/μm are used as input signals to achieve the working mechanism, and the total current density distribution in all the device structures are obtained at 100 ns in Fig. 2[16].

Figure  2.  (Color online) The total current density distribution in the DTSCR device structure (a), (b) and (c) under the pulses of 0.01, 0.6, and 2 mA/μm at 100 ns. This indicates the identical physical process among the three device structures: @ 0.01 mA/μm only the diode chain turns on, then @ 0.6 mA/μm the parasitic SCR is open and at last @ 2 mA/μm the intrinsic SCR is forced on.

It can be observed that the three device structures follow the identical physical process: only the diode chain is open @ 0.01 mA/μm, then the current pulse is increased and the parasitic SCR turns on @ 0.6 mA/μm, and at last the intrinsic SCR is forced on @ 2 mA/μm. It can be obtained that inserting a large space between the D1 and D2 diode does not change the physical rule that the parasitic SCR is triggered at a smaller current level than that required in the intrinsic one. When the current pulse is as small as 0.01 mA/μm, the current density distribution is almost the same among the three devices due to the non-existent parasitic SCR path. The distinction in the current density emerges as the current pulse is improved to 0.6 mA/μm, which hints that putting a large space between the trigger diodes D1 and D2 may result in the variation of current division between the intrinsic and parasitic SCR. Therefore, the terminal current of the device structure (a) under the pulse of 0.6 mA/μm is extracted to analyze this issue in Fig. 3.

Figure  3.  The terminal current of the device structure (a) extracted at 100 ns under the pulse of 0.6 mA/μm.

Fig. 3 shows the terminal current versus time curves of the device structure (a) procured at 100 ns under the pulse of 0.6 mA/μm. Under this current pulse, the intrinsic SCR is not switched on to discharge the ESD current. Therefore, the current division between the intrinsic and parasitic SCR can be observed in Fig. 3, which is caused by the distribution of Rx and Ry parasitic resistance. As the space between the trigger diodes D1 and D2 is increased, more current will be injected into the intrinsic SCR route due to the increased Ry. The discussions are well confirmed by the device simulation results in Fig. 4.

Figure  4.  The terminal current of the device structure (a), (b), and (c) procured at 100 ns under the pulse of 0.6 mA/μm. The injected current in the intrinsic SCR routine is regularly increased as the space between the trigger diodes D1 and D2 is increased from device structure (a) to (c).

Fig. 4 exhibits the current variation in the intrinsic and parasitic SCR routines along with the linearly increased space between the D1 and D2 diode. The improved Ry results in more current existing in the intrinsic SCR path. In other words, the current required in the parasitic SCR triggering process is reduced as the space is enlarged. As a result, the triggering current in the DTSCR device structures is regularly decreased. The three device structures are realized in a standard 65-nm CMOS process and characterized by Thermo Scientific TLP test system, the test results are shown in Fig. 5, which accords well with the theoretical analysis.

Figure  5.  The TLP I-V curves of the DTSCR device structure (a), (b), and (c), the triggering current in the second snapback is regularly reduced, while the larger overall trigger voltage, caused by the multiple triggering effect, decreases at first and then increases.

In Fig. 5, it can be observed that the triggering current is reduced in regularity from device structure (a) to (c). Due to the improved parasitic resistance, the trigger voltage at the second snapback is reduced at first and then increased. Obviously, the measuring results are in good agreement with the above analysis. Compared with the typical DTSCR (device structure (a)), the modified structures (device structure (b) and (c)) achieve the minimized multiple triggering effect.

A deeper insight into the underlying physics behind the multiple-triggering effect in DTSCRs is presented in this paper. Inserting large space in the trigger diodes is proposed to investigate the current division law between the intrinsic and parasitic SCR. Through device simulations and TLP test, it is summarized that the triggering current is reduced as the parasitic SCR resistance increases and the multiple triggering effect is the comprehensive result of the parasitic resistance and triggering current. In addition, the modified DTSCR device structures with larger space between trigger diodes can obtain the minimized multiple triggering effect.



[1]
Liao C J, Liu J Z, Liu Z W. A novel HBT trigger SCR in 0.35 μm SiGe BiCMOS technology. J Semicond, 2016, 37(9): 094004 doi: 10.1088/1674-4926/37/9/094004
[2]
Chen W Y, RosenBaum E, Ker M D. Diode-triggered silicon-controlled rectifier with reduced voltage overshoot for CDM ESD Protection. IEEE Trans Device Mater Rel, 2012, 12(1):10 doi: 10.1109/TDMR.2011.2171487
[3]
Liu J Z, Liu Z W, Jia Z, et al. A novel DTSCR with a variation lateral base doping structure to improve turn-on speed for ESD protection. J Semicond, 2014, 35(6): 064010 doi: 10.1088/1674-4926/35/6/064010
[4]
Zhang L Z, Wang Y, Lu G Y, et al. A novel diode string triggered gated-PiN junction device for electrostatic discharge protection in 65-nm CMOS technology. Chin Phys B, 2015, 24(10): 108503 doi: 10.1088/1674-1056/24/10/108503
[5]
Li J J, Sarro Di J, Li Y, et al. Investigation of SOI SCR triggering and current sustaining under DC and TLP conditions. Proc IEEE EOS/ESD Symp, 2013: 1 https://www.researchgate.net/publication/261446593_Investigation_of_SOI_SCR_triggering_and_current_sustaining_under_DC_and_TLP_conditions
[6]
Ginawi A, Xia T, Gauthier R. Reducing the turn-on time and overshoot voltage for a diode-triggered silicon-controlled rectifier during an electrostatic discharge event. Proc IEEE SOCC Symp, 2014: 1 https://www.researchgate.net/publication/287573967_Reducing_the_turn-on_time_and_overshoot_voltage_for_a_diode-triggered_silicon-controlled_rectifier_during_an_electrostatic_discharge_event
[7]
Mishra R, Li J J, Sarro Di J, et al. Effect of embedded-SiGe (eSiGe) on ESD TLP and VFTLP characteristics of diode-triggered silicon controlled rectifiers (DTSCRs). Proc IEEE EOS/ESD Symp, 2012 http://ieeexplore.ieee.org/xpl/abstractKeywords.jsp?reload=true&arnumber=6333323
[8]
Dong S R, Jin H, Miao M, et al. Novel capacitance coupling complementary dual-direction SCR for high-voltage. IEEE Electron Device Lett, 2012, 33(5): 640 doi: 10.1109/LED.2012.2188015
[9]
Bi X W, Liang H L, Gu X F, et al. Design of novel DDSCR with embedded PNP structure for ESD protection. J Semicond, 2015, 36(12): 124007 doi: 10.1088/1674-4926/36/12/124007
[10]
Lin C Y, Chu L W, Ker M D, et al. ESD protection structure with inductor-triggered SCR for RF applications in 65-nm CMOS process. Proc IEEE IRPS Symp, 2012: 1 https://www.infona.pl/resource/bwmeta1.element.ieee-art-000006241893
[11]
Sarro Di J, Chatty K, Gauthier R, et al. Evaluation of SCR-based ESD protection devices in 90 nm and 65 nm CMOS technologies. Proc IEEE IRPS Symp, 2007: 1 https://www.researchgate.net/publication/4252374_Evaluation_of_SCR-based_ESD_protection_devices_in_90nm_and_65nm_CMOS_technologies
[12]
Lin C Y, Wu P H, Ker M D. Area-efficient and low-leakage diode string for on-chip ESD protection. IEEE Trans Electron Devices, 2015, 63(2): 531 http://ieeexplore.ieee.org/document/7353163/citations
[13]
Zhang P, Wang Y, Jia S, et al. LDMOS-SCR: a replacement for LDMOS with high ESD self-protection ability for HV application. Semicond Sci Technol, 2012, 27(3): 035006 doi: 10.1088/0268-1242/27/3/035006
[14]
Wang Y, Lu G Y, Cao J, et al. Analysis of dummy-gate dual-directional SCR (dSCR) device for ESD protection. Proc IEEE IPFA Symp, 2013: 720 https://www.researchgate.net/publication/261195271_Analysis_of_dummy-gate_dual-directional_SCR_dSCR_device_for_ESD_protection
[15]
Miao M, Dong S R, Wu J, et al. Minimizing multiple triggering effect in diode-triggered silicon-controlled rectifiers for ESD protection applications. IEEE Electron Device Lett, 2012, 33(6): 893 doi: 10.1109/LED.2012.2191930
[16]
Shrivastava M, Schneider J, Jain R, et al. IGBT plugged in SCR device for ESD protection in advanced CMOS Technology. Proc, IEEE EOS/ESD Symp, 2009: 1 https://www.researchgate.net/publication/224084060_IGBT_plugged_in_SCR_device_for_ESD_protection_in_advanced_CMOS_technology
Fig. 1.  (a) The cross-section, (b) equivalent circuit, (c) and layout top view of the modified DTSCR structure with a large space between the trigger diodes D1 and D2.

Fig. 2.  (Color online) The total current density distribution in the DTSCR device structure (a), (b) and (c) under the pulses of 0.01, 0.6, and 2 mA/μm at 100 ns. This indicates the identical physical process among the three device structures: @ 0.01 mA/μm only the diode chain turns on, then @ 0.6 mA/μm the parasitic SCR is open and at last @ 2 mA/μm the intrinsic SCR is forced on.

Fig. 3.  The terminal current of the device structure (a) extracted at 100 ns under the pulse of 0.6 mA/μm.

Fig. 4.  The terminal current of the device structure (a), (b), and (c) procured at 100 ns under the pulse of 0.6 mA/μm. The injected current in the intrinsic SCR routine is regularly increased as the space between the trigger diodes D1 and D2 is increased from device structure (a) to (c).

Fig. 5.  The TLP I-V curves of the DTSCR device structure (a), (b), and (c), the triggering current in the second snapback is regularly reduced, while the larger overall trigger voltage, caused by the multiple triggering effect, decreases at first and then increases.

[1]
Liao C J, Liu J Z, Liu Z W. A novel HBT trigger SCR in 0.35 μm SiGe BiCMOS technology. J Semicond, 2016, 37(9): 094004 doi: 10.1088/1674-4926/37/9/094004
[2]
Chen W Y, RosenBaum E, Ker M D. Diode-triggered silicon-controlled rectifier with reduced voltage overshoot for CDM ESD Protection. IEEE Trans Device Mater Rel, 2012, 12(1):10 doi: 10.1109/TDMR.2011.2171487
[3]
Liu J Z, Liu Z W, Jia Z, et al. A novel DTSCR with a variation lateral base doping structure to improve turn-on speed for ESD protection. J Semicond, 2014, 35(6): 064010 doi: 10.1088/1674-4926/35/6/064010
[4]
Zhang L Z, Wang Y, Lu G Y, et al. A novel diode string triggered gated-PiN junction device for electrostatic discharge protection in 65-nm CMOS technology. Chin Phys B, 2015, 24(10): 108503 doi: 10.1088/1674-1056/24/10/108503
[5]
Li J J, Sarro Di J, Li Y, et al. Investigation of SOI SCR triggering and current sustaining under DC and TLP conditions. Proc IEEE EOS/ESD Symp, 2013: 1 https://www.researchgate.net/publication/261446593_Investigation_of_SOI_SCR_triggering_and_current_sustaining_under_DC_and_TLP_conditions
[6]
Ginawi A, Xia T, Gauthier R. Reducing the turn-on time and overshoot voltage for a diode-triggered silicon-controlled rectifier during an electrostatic discharge event. Proc IEEE SOCC Symp, 2014: 1 https://www.researchgate.net/publication/287573967_Reducing_the_turn-on_time_and_overshoot_voltage_for_a_diode-triggered_silicon-controlled_rectifier_during_an_electrostatic_discharge_event
[7]
Mishra R, Li J J, Sarro Di J, et al. Effect of embedded-SiGe (eSiGe) on ESD TLP and VFTLP characteristics of diode-triggered silicon controlled rectifiers (DTSCRs). Proc IEEE EOS/ESD Symp, 2012 http://ieeexplore.ieee.org/xpl/abstractKeywords.jsp?reload=true&arnumber=6333323
[8]
Dong S R, Jin H, Miao M, et al. Novel capacitance coupling complementary dual-direction SCR for high-voltage. IEEE Electron Device Lett, 2012, 33(5): 640 doi: 10.1109/LED.2012.2188015
[9]
Bi X W, Liang H L, Gu X F, et al. Design of novel DDSCR with embedded PNP structure for ESD protection. J Semicond, 2015, 36(12): 124007 doi: 10.1088/1674-4926/36/12/124007
[10]
Lin C Y, Chu L W, Ker M D, et al. ESD protection structure with inductor-triggered SCR for RF applications in 65-nm CMOS process. Proc IEEE IRPS Symp, 2012: 1 https://www.infona.pl/resource/bwmeta1.element.ieee-art-000006241893
[11]
Sarro Di J, Chatty K, Gauthier R, et al. Evaluation of SCR-based ESD protection devices in 90 nm and 65 nm CMOS technologies. Proc IEEE IRPS Symp, 2007: 1 https://www.researchgate.net/publication/4252374_Evaluation_of_SCR-based_ESD_protection_devices_in_90nm_and_65nm_CMOS_technologies
[12]
Lin C Y, Wu P H, Ker M D. Area-efficient and low-leakage diode string for on-chip ESD protection. IEEE Trans Electron Devices, 2015, 63(2): 531 http://ieeexplore.ieee.org/document/7353163/citations
[13]
Zhang P, Wang Y, Jia S, et al. LDMOS-SCR: a replacement for LDMOS with high ESD self-protection ability for HV application. Semicond Sci Technol, 2012, 27(3): 035006 doi: 10.1088/0268-1242/27/3/035006
[14]
Wang Y, Lu G Y, Cao J, et al. Analysis of dummy-gate dual-directional SCR (dSCR) device for ESD protection. Proc IEEE IPFA Symp, 2013: 720 https://www.researchgate.net/publication/261195271_Analysis_of_dummy-gate_dual-directional_SCR_dSCR_device_for_ESD_protection
[15]
Miao M, Dong S R, Wu J, et al. Minimizing multiple triggering effect in diode-triggered silicon-controlled rectifiers for ESD protection applications. IEEE Electron Device Lett, 2012, 33(6): 893 doi: 10.1109/LED.2012.2191930
[16]
Shrivastava M, Schneider J, Jain R, et al. IGBT plugged in SCR device for ESD protection in advanced CMOS Technology. Proc, IEEE EOS/ESD Symp, 2009: 1 https://www.researchgate.net/publication/224084060_IGBT_plugged_in_SCR_device_for_ESD_protection_in_advanced_CMOS_technology
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    Lizhong Zhang, Yuan Wang, Yize Wang, Yandong He. Insight into multiple-triggering effect in DTSCRs for ESD protection[J]. Journal of Semiconductors, 2017, 38(7): 075001. doi: 10.1088/1674-4926/38/7/075001
    L Z Zhang, Y Wang, Y Z Wang, Yandong He and O N He. Insight into multiple-triggering effect in DTSCRs for ESD protection[J]. J. Semicond., 2017, 38(7): 075001. doi: 10.1088/1674-4926/38/7/075001.
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    Received: 06 December 2016 Revised: 12 January 2017 Online: Published: 01 July 2017

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      Lizhong Zhang, Yuan Wang, Yize Wang, Yandong He. Insight into multiple-triggering effect in DTSCRs for ESD protection[J]. Journal of Semiconductors, 2017, 38(7): 075001. doi: 10.1088/1674-4926/38/7/075001 ****L Z Zhang, Y Wang, Y Z Wang, Yandong He and O N He. Insight into multiple-triggering effect in DTSCRs for ESD protection[J]. J. Semicond., 2017, 38(7): 075001. doi: 10.1088/1674-4926/38/7/075001.
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      Lizhong Zhang, Yuan Wang, Yize Wang, Yandong He. Insight into multiple-triggering effect in DTSCRs for ESD protection[J]. Journal of Semiconductors, 2017, 38(7): 075001. doi: 10.1088/1674-4926/38/7/075001 ****
      L Z Zhang, Y Wang, Y Z Wang, Yandong He and O N He. Insight into multiple-triggering effect in DTSCRs for ESD protection[J]. J. Semicond., 2017, 38(7): 075001. doi: 10.1088/1674-4926/38/7/075001.

      Insight into multiple-triggering effect in DTSCRs for ESD protection

      DOI: 10.1088/1674-4926/38/7/075001
      Funds:

      the Beijing Natural Science Foundation, China 4162030

      Project supported by the Beijing Natural Science Foundation, China (No. 4162030)

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      • Corresponding author: Yuan Wang, E-mail:wangyuan@pku.edu.cn; Yandong He, E-mail:heyd@pku.edu.cn
      • Received Date: 2016-12-06
      • Revised Date: 2017-01-12
      • Published Date: 2017-07-01

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