Chin. J. Semicond. > 1998, Volume 19 > Issue 6 > 458-462
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一种简便有效的多孔硅后处理新方法

熊祖洪 , 刘小兵 , 廖良生 , 袁帅 , 何钧 , 周翔 , 曹先安 , 丁训民 and 侯晓远

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    Received: 18 August 2015 Revised: Online: Published: 01 June 1998

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      Article Navigation >  Journal of Semiconductors  > 1998  >  19(6): 458-462
      熊祖洪, 刘小兵, 廖良生, 袁帅, 何钧, 周翔, 曹先安, 丁训民, 侯晓远. 一种简便有效的多孔硅后处理新方法[J]. 半导体学报(英文版), 1998, 19(6): 458-462.
      Citation:
      熊祖洪, 刘小兵, 廖良生, 袁帅, 何钧, 周翔, 曹先安, 丁训民, 侯晓远. 一种简便有效的多孔硅后处理新方法[J]. 半导体学报(英文版), 1998, 19(6): 458-462.
      shu

      • Received Date: 2015-08-18

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