Chin. J. Semicond. > 2004, Volume 25 > Issue 12 > 1726-1729
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ULSI铜多层布线中钽阻挡层CMP抛光液的研究与优化

邢哲 , 刘玉岭 , 檀柏梅 , 王新 and 李薇薇

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Key words: 多层布线, 化学机械抛光, 阻挡层, 抛光液, 选择性

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    Received: 19 August 2015 Revised: Online: Published: 01 December 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(12): 1726-1729
      邢哲, 刘玉岭, 檀柏梅, 王新, 李薇薇. ULSI铜多层布线中钽阻挡层CMP抛光液的研究与优化[J]. 半导体学报(英文版), 2004, 25(12): 1726-1729.
      Citation:
      邢哲, 刘玉岭, 檀柏梅, 王新, 李薇薇. ULSI铜多层布线中钽阻挡层CMP抛光液的研究与优化[J]. 半导体学报(英文版), 2004, 25(12): 1726-1729.
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      • Received Date: 2015-08-19

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