Chin. J. Semicond. > 2005, Volume 26 > Issue 5 > 1065-1071

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厚层抗蚀剂曝光模型及其参数测量

刘世杰 , 杜惊雷 , 段茜 , 罗铂靓 , 唐雄贵 , 郭永康 and 杜春雷

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Key words: 厚层抗蚀剂, 光刻, 曝光, 增强Dill模型, 曝光参数

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    Received: 19 August 2015 Revised: Online: Published: 01 May 2005

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      Article Navigation >  Journal of Semiconductors  > 2005  >  26(5): 1065-1071
      刘世杰, 杜惊雷, 段茜, 罗铂靓, 唐雄贵, 郭永康, 杜春雷. 厚层抗蚀剂曝光模型及其参数测量[J]. 半导体学报(英文版), 2005, 26(5): 1065-1071.
      Citation:
      刘世杰, 杜惊雷, 段茜, 罗铂靓, 唐雄贵, 郭永康, 杜春雷. 厚层抗蚀剂曝光模型及其参数测量[J]. 半导体学报(英文版), 2005, 26(5): 1065-1071.
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      • Received Date: 2015-08-19

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