Chin. J. Semicond. > 2005, Volume 26 > Issue 5 > 970-976
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微量铜-铁对硅片表面污染的初步分析

郑宣 and 程璇

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Key words: 硅片清洗, 金属污染, 铜沉积, 碳污染

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    Received: 19 August 2015 Revised: Online: Published: 01 May 2005

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      Article Navigation >  Journal of Semiconductors  > 2005  >  26(5): 970-976
      郑宣, 程璇. 微量铜-铁对硅片表面污染的初步分析[J]. 半导体学报(英文版), 2005, 26(5): 970-976.
      Citation:
      郑宣, 程璇. 微量铜-铁对硅片表面污染的初步分析[J]. 半导体学报(英文版), 2005, 26(5): 970-976.
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      • Received Date: 2015-08-19

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