Chin. J. Semicond. > 2004, Volume 25 > Issue 6 > 668-673
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直流反应磁控溅射Al,N共掺方法生长p型ZnO薄膜及其特性

袁国栋 , 叶志镇 , 曾昱嘉 , 吕建国 , 钱庆 , 黄靖云 , 赵炳辉 and 朱丽萍

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Key words: Al,N共掺杂技术, p-ZnO, 直流反应磁控溅射

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    Received: 19 August 2015 Revised: Online: Published: 01 June 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(6): 668-673
      袁国栋, 叶志镇, 曾昱嘉, 吕建国, 钱庆, 黄靖云, 赵炳辉, 朱丽萍. 直流反应磁控溅射Al,N共掺方法生长p型ZnO薄膜及其特性[J]. 半导体学报(英文版), 2004, 25(6): 668-673.
      Citation:
      袁国栋, 叶志镇, 曾昱嘉, 吕建国, 钱庆, 黄靖云, 赵炳辉, 朱丽萍. 直流反应磁控溅射Al,N共掺方法生长p型ZnO薄膜及其特性[J]. 半导体学报(英文版), 2004, 25(6): 668-673.
      shu

      • Received Date: 2015-08-19

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