Chin. J. Semicond. > 2004, Volume 25 > Issue 1 > 104-108
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镓杂质R_S效应的研究与分析

孙瑛 , 刘志军 and 刘秀喜

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Key words: 杂质RS效应, 裸Si系, SiO2/Si系, 氧化膜

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    Received: 19 August 2015 Revised: Online: Published: 01 January 2004

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      Article Navigation >  Journal of Semiconductors  > 2004  >  25(1): 104-108
      孙瑛, 刘志军, 刘秀喜. 镓杂质R_S效应的研究与分析[J]. 半导体学报(英文版), 2004, 25(1): 104-108.
      Citation:
      孙瑛, 刘志军, 刘秀喜. 镓杂质R_S效应的研究与分析[J]. 半导体学报(英文版), 2004, 25(1): 104-108.
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      • Received Date: 2015-08-19

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