Chin. J. Semicond. > 1986, Volume 7 > Issue 5 > 539-542
|

CONTENTS

掺杂(硼和磷)a-Si_(1-x)C_x:H膜中氢含量的测量

陈光华 , 张仿清 , 徐希翔 and 清水立生

+ Author Affiliations

PDF

    • Search

    Advanced Search >>

    GET CITATION

    shu

    Export: BibTex EndNote

    Article Metrics

    Article views: 2003 Times PDF downloads: 938 Times Cited by: 0 Times

    History

    Received: 20 August 2015 Revised: Online: Published: 01 May 1986

    Catalog

      Email This Article

      User name:
      Email:*请输入正确邮箱
      Code:*验证码错误
      Send
      Article Navigation >  Journal of Semiconductors  > 1986  >  7(5): 539-542
      陈光华, 张仿清, 徐希翔, 清水立生. 掺杂(硼和磷)a-Si_(1-x)C_x:H膜中氢含量的测量[J]. 半导体学报(英文版), 1986, 7(5): 539-542.
      Citation:
      陈光华, 张仿清, 徐希翔, 清水立生. 掺杂(硼和磷)a-Si_(1-x)C_x:H膜中氢含量的测量[J]. 半导体学报(英文版), 1986, 7(5): 539-542.
      shu

      • Received Date: 2015-08-20

      Catalog

        Journal of Semiconductors © 2017 All Rights Reserved   京ICP备05085259号-2

        /

        DownLoad:  Full-Size Img  PowerPoint
        Return
        Return