| Citation: |
Dai Liping, Deng Hong, Chen Gen, Chen Jinju. A Novel Solid Source for Fabrication of High Quality ZnO Film[J]. Journal of Semiconductors, 2007, 28(S1): 271-274.
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Dai L P, Deng H, Chen G, Chen J J. A Novel Solid Source for Fabrication of High Quality ZnO Film[J]. Chin. J. Semicond., 2007, 28(S1): 271.
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A Novel Solid Source for Fabrication of High Quality ZnO Film
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Abstract
A novel solid source was used for fabrication of high quality ZnO thin film on silicon(100)by single source chemi cal vapor deposition(SSCVD).The ZnO films were characterized by Fourier transform infrared spectroscopy and thermo gravimetric analysis，proving that the solid source is with the chemical formula of Zrh(OH)2(02 CCH3)6·2H2O and has volatility and thermolysis properties suitable for the growth of ZnO film bV SSCVD. Also，the ZnO films were evaluated X. ray diffraction，scanning electronic microscope，X-ray photoelectron spectroscopy，and photoluminescence measurement. The results demonstrate that the films are of high quality.-
Keywords:
- solid source,
- SSCVD,
- ZnO thin film,
- photoluminescenc
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References
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Proportional views
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