Chin. J. Semicond. > 2005, Volume 26 > Issue 1 > 34-37

CONTENTS

非晶硅碳(a-SiC∶H)薄膜光学常数的透射谱表征

胡志华 and 廖显伯

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Abstract: 报道了一种用透射谱数据分析法计算非晶硅碳薄膜的厚度、折射率、吸收系数和光学带隙等光学常数的方法和程序.这一方法引用有效谐振子模型理论的折射率色散关系,所有公式均为解析表达式,便于进行数据处理,无须专用软件,使用Excel即可完成,适用于多种半导体薄膜材料.将这种方法应用于PECVD方法制备的非晶硅碳(a-SiC∶H)薄膜,对其光学特性进行了分析.

1

Study of the effect of switching speed of the a-SiC/c-Si (p)-based, thyristor-like, ultra-high-speed switches, using two-dimensional simulation techniques

Evangelos I. Dimitriadis, Nikolaos Georgoulas

Journal of Semiconductors, 2017, 38(5): 054001. doi: 10.1088/1674-4926/38/5/054001

2

Fabrication of SiC nanowire thin-film transistors using dielectrophoresis

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Journal of Semiconductors, 2012, 33(11): 114001. doi: 10.1088/1674-4926/33/11/114001

3

Influence of absorber doping in a-SiC:H/a-Si:H/a-SiGe:H solar cells

Muhammad Nawaz, Ashfaq Ahmad

Journal of Semiconductors, 2012, 33(4): 042001. doi: 10.1088/1674-4926/33/4/042001

4

Influence of sputtering pressure on optical constants of a-GaAs1-xNx thin films

Jia Baoshan, Wang Yunhua, Zhou Lu, Bai Duanyuan, Qiao Zhongliang, et al.

Journal of Semiconductors, 2012, 33(8): 083002. doi: 10.1088/1674-4926/33/8/083002

5

Effect of n Doped Layers in an Amorphous Silicon Top Solar Cell on the Performance of "Micromorph" Tandem Solar Cells

Han Xiaoyan, Li Guijun, Hou Guofu, Zhang Xiaodan, Zhang Dekun, et al.

Journal of Semiconductors, 2008, 29(8): 1548-1551.

6

A Structural Investigation of 3C-SiC Film Hetero-Epitaxial Grown on 6H-SiC Substrate

Lin Tao, Li Qingmin, Li Lianbi, Yang Ying, Chen Zhiming, et al.

Journal of Semiconductors, 2008, 29(5): 936-939.

7

Thermal Sensitive Characteristics of Phosphor-Doped Hydrogenated Amorphous Silicon by PECVD

Ma Tieying, Li Tie, Liu Wenping, Wang Yuelin

Journal of Semiconductors, 2008, 29(11): 2265-2269.

8

Mechanism of Thermal Oxidation of 3C.SiC Grown on Si

Zhao Yongmei, Sun Guosheng, Liu Xingfang, Li Jiaye, Zhao Wanshun, et al.

Chinese Journal of Semiconductors , 2007, 28(S1): 4-3.

9

Fast Epitaxy of 3C-SiC Grown on Si Substrate

Li Jiaye, Zhao Yongmei, Liu Xingfang, Sun Guosheng, Wang Lei, et al.

Chinese Journal of Semiconductors , 2007, 28(S1): 218-220.

10

Structural Analysis of the SiCGe Epitaxial Layer Grown on SiC Substrate

Li Lianbi, Chen Zhiming, Pu Hongbin, Lin Tao, Li Jia, et al.

Chinese Journal of Semiconductors , 2007, 28(S1): 123-126.

11

Analysis of Interface Luminescence in Nano-Sized Amorphous Silicon

Fu Guangsheng, Zhang Jiangyong, Ding Wenge, Lü Xueqin, Yu Wei, et al.

Chinese Journal of Semiconductors , 2007, 28(S1): 91-94.

12

Optical Properties of Ultralong Hexagonal Polytype Nano-Silicon Carbide Rod

Zhang Hongtao, Chen Kun, Lemmer U, Bastian G

Chinese Journal of Semiconductors , 2006, 27(S1): 117-119.

13

Deposition of SiCN Nano-Films by Sputtering Method on Quartz Substrate

Lin Hongfeng, Xie Erqing, Zhang Jun, Yan Xiaoqin, 陈支勇, et al.

Chinese Journal of Semiconductors , 2006, 27(S1): 124-126.

14

Tight Binding of Photoluminescence in the SiC/nc-Si Multi-Layer Film

Liang Zhijun, Wang Zhibin, Wang Li, Zhao Fuli, Yang Shenghong, et al.

Chinese Journal of Semiconductors , 2006, 27(S1): 72-75.

15

Ohmic Contact on SiC Using n+ Polysilicon/n+ SiC Heterojunction

Zhang Lin, Zhang Yimen, Zhang Yuming, Tang Xiaoyan

Chinese Journal of Semiconductors , 2006, 27(S1): 378-380.

16

硅基AlN薄膜制备技术与测试分析

于毅, 任天令, 刘理天

Chinese Journal of Semiconductors , 2005, 26(1): 42-45.

17

Growth of (111) Textured 3C-SiC on Si (111) by Low Energy Ion Beam Deposition

Yang Fei, Chen Nuofu, Zhang Xingwang, Yang Shaoyan, Liu Zhikai, et al.

Chinese Journal of Semiconductors , 2005, 26(12): 2385-2389.

18

用透过率测试曲线确定半导体薄膜的光学常数和厚度

沈伟东, 刘旭, 朱勇, 邹桐, 叶辉, et al.

Chinese Journal of Semiconductors , 2005, 26(2): 335-340.

19

溅射参数对Ge_2Sb_2Te_5薄膜光学常数的影响

Chinese Journal of Semiconductors , 2001, 22(2): 187-192.

20

硅中离子注入层光学常数的振荡分布

Chinese Journal of Semiconductors , 1982, 3(1): 76-79.

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    Received: 19 August 2015 Revised: Online: Published: 01 January 2005

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      胡志华, 廖显伯. 非晶硅碳(a-SiC∶H)薄膜光学常数的透射谱表征[J]. Journal of Semiconductors, 2005, 26(1): 34-37. ****胡志华, 廖显伯, 非晶硅碳(a-SiC∶H)薄膜光学常数的透射谱表征[J]. Journal of Semiconductors, 2005, 26(1), 34-37
      Citation:
      胡志华, 廖显伯. 非晶硅碳(a-SiC∶H)薄膜光学常数的透射谱表征[J]. Journal of Semiconductors, 2005, 26(1): 34-37. ****
      胡志华, 廖显伯, 非晶硅碳(a-SiC∶H)薄膜光学常数的透射谱表征[J]. Journal of Semiconductors, 2005, 26(1), 34-37

      非晶硅碳(a-SiC∶H)薄膜光学常数的透射谱表征

      • Received Date: 2015-08-19

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