Chin. J. Semicond. > 1997, Volume 18 > Issue 2 > 146-150
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砷化镓晶体在氯化硫溶液中腐蚀速率的研究

曹先安 , 陈溪滢 , 李喆深 , 丁训民 and 侯晓远

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    Received: 19 August 2015 Revised: Online: Published: 01 February 1997

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      Article Navigation >  Journal of Semiconductors  > 1997  >  18(2): 146-150
      曹先安, 陈溪滢, 李喆深, 丁训民, 侯晓远. 砷化镓晶体在氯化硫溶液中腐蚀速率的研究[J]. 半导体学报(英文版), 1997, 18(2): 146-150.
      Citation:
      曹先安, 陈溪滢, 李喆深, 丁训民, 侯晓远. 砷化镓晶体在氯化硫溶液中腐蚀速率的研究[J]. 半导体学报(英文版), 1997, 18(2): 146-150.
      shu

      • Received Date: 2015-08-19

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