Citation: |
刘新宇, 孙海峰, 陈焕章, 扈焕章, 海潮和, 刘忠立, 和致经, 吴德馨. 部分耗尽CMOS/SOI工艺[J]. 半导体学报(英文版), 2001, 22(6): 806-810.
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Proportional views
Key words: PBL, 沟道工程, 双层布线
Article views: 2571 Times PDF downloads: 999 Times Cited by: 0 Times
Received: 20 August 2015 Revised: Online: Published: 01 June 2001
Citation: |
刘新宇, 孙海峰, 陈焕章, 扈焕章, 海潮和, 刘忠立, 和致经, 吴德馨. 部分耗尽CMOS/SOI工艺[J]. 半导体学报(英文版), 2001, 22(6): 806-810.
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