Chin. J. Semicond. > 2005, Volume 26 > Issue 3 > 517-523

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勾形磁场下直径300mm CZ Si熔体中氧浓度分布的数值模拟

宇慧平, 隋允康, 张峰翊 and 常新安

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Abstract: 采用低雷诺数K-ε紊流模型,考虑自然对流、晶体旋转和坩埚旋转等因素,对晶体直径为300mm,磁场强度变化范围在0~0.12T条件下,熔体硅内流场及氧的浓度分布、磁场分布等作了数值模拟.计算中采用有限体积法,运用SIMPLE(semiimplicit method for pressure linked equations)算法耦合压力和速度场,动量方程、能量方程中对流项的离散采用QUICK(quadratic upwind interpolation of convective kinematics)格式,紊动能和耗散项方程中对流项的离散采用迎风格式.数值模拟结果表明,在勾形磁场作用下,熔体硅内的流场、氧的浓度分布与无磁场作用相比有较大不同,随着磁场强度的增加,生长界面处氧的浓度降低,并且磁场确实能有效地抑制熔体内的紊流,有利于晶体生长.

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    Received: 19 August 2015 Revised: Online: Published: 01 March 2005

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      宇慧平, 隋允康, 张峰翊, 常新安. 勾形磁场下直径300mm CZ Si熔体中氧浓度分布的数值模拟[J]. Journal of Semiconductors, 2005, 26(3): 517-523. ****勾形磁场下直径300mm CZ Si熔体中氧浓度分布的数值模拟[J]. Chin. J. Semicond., 2005, 26(3): 517.
      Citation:
      宇慧平, 隋允康, 张峰翊, 常新安. 勾形磁场下直径300mm CZ Si熔体中氧浓度分布的数值模拟[J]. Journal of Semiconductors, 2005, 26(3): 517-523. ****
      勾形磁场下直径300mm CZ Si熔体中氧浓度分布的数值模拟[J]. Chin. J. Semicond., 2005, 26(3): 517.

      勾形磁场下直径300mm CZ Si熔体中氧浓度分布的数值模拟

      • Received Date: 2015-08-19

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