Chin. J. Semicond. > 2000, Volume 21 > Issue 10 > 993-998
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SIMOX薄膜材料的红外光谱特性和薄膜厚度的非破坏性测量方法

卢殿通 and P L F Hemment

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Key words: SIMOX薄膜, 红外光谱, 非破坏性测量

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    Received: 20 August 2015 Revised: Online: Published: 01 October 2000

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      Article Navigation >  Journal of Semiconductors  > 2000  >  21(10): 993-998
      卢殿通, P L F Hemment. SIMOX薄膜材料的红外光谱特性和薄膜厚度的非破坏性测量方法[J]. 半导体学报(英文版), 2000, 21(10): 993-998.
      Citation:
      卢殿通, P L F Hemment. SIMOX薄膜材料的红外光谱特性和薄膜厚度的非破坏性测量方法[J]. 半导体学报(英文版), 2000, 21(10): 993-998.
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      • Received Date: 2015-08-20

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