Chin. J. Semicond. > 2001, Volume 22 > Issue 2 > 171-176
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ZnTeCu薄膜的制备及其性能

郑家贵 , 张静全 , 蔡伟 , 黎兵 , 蔡亚平 and 冯良桓

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Key words: ZnTe∶Cu薄膜, 制备, 测试

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    Received: 19 August 2015 Revised: Online: Published: 01 February 2001

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      Article Navigation >  Journal of Semiconductors  > 2001  >  22(2): 171-176
      郑家贵, 张静全, 蔡伟, 黎兵, 蔡亚平, 冯良桓. ZnTeCu薄膜的制备及其性能[J]. 半导体学报(英文版), 2001, 22(2): 171-176.
      Citation:
      郑家贵, 张静全, 蔡伟, 黎兵, 蔡亚平, 冯良桓. ZnTeCu薄膜的制备及其性能[J]. 半导体学报(英文版), 2001, 22(2): 171-176.
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      • Received Date: 2015-08-19

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