Abstract: 用氯氟酸硝酸水溶液对硅单晶抛光片进行染色腐蚀,制备了多孔硅.本文研究染色腐蚀多孔硅的光致可见光发光特性,特别是激发光强度和波长与发射光强度与波长的关系,多孔硅的稳定性和响应特性.
Article views: 1709 Times PDF downloads: 1089 Times Cited by: 0 Times
Manuscript received: 19 August 2015 Manuscript revised: Online: Published: 01 October 1994
Journal of Semiconductors © 2017 All Rights Reserved 京ICP备05085259号-2