Chin. J. Semicond. > Volume 12 > Issue 10 > Article Number: 588

MBE GaAs/Si材料应力性质的研究

胡福义 , 李爱珍 and 王建新

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Abstract: 用光致发光谱及高分辨率的X射线双晶衍射对 MBE GaAs/Si异质结材料进行研究,发现GaAs外延层和Si衬底存在一定的晶向偏离,整个GaAs外延层呈现双轴张应力,这是GaAs和Si的晶格失配导致的双轴压应力和热膨胀系数失配导致的双轴张应力的总结果.本文根据一定的物理假设,推导出GaAs外延层中的平均应力,表明应力与材料所处的温度相关.据此,本文进一步用光致发光谱测量了25K至 260K温度范围内的应力,发现应力随温度的增大而下降,与理论公式反映的规律吻合.

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History

Manuscript received: 19 August 2015 Manuscript revised: Online: Published: 01 October 1991

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