Chin. J. Semicond. > 1990, Volume 11 > Issue 3 > 193-201
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TEA CO_2激光诱发SiH_4等离子体发光动力学研究

傅广生 , 董丽芳 , 李晓苇 , 韩理 , 张连水 and 吕福润

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    Received: 19 August 2015 Revised: Online: Published: 01 March 1990

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      Article Navigation >  Journal of Semiconductors  > 1990  >  11(3): 193-201
      傅广生, 董丽芳, 李晓苇, 韩理, 张连水, 吕福润. TEA CO_2激光诱发SiH_4等离子体发光动力学研究[J]. 半导体学报(英文版), 1990, 11(3): 193-201.
      Citation:
      傅广生, 董丽芳, 李晓苇, 韩理, 张连水, 吕福润. TEA CO_2激光诱发SiH_4等离子体发光动力学研究[J]. 半导体学报(英文版), 1990, 11(3): 193-201.
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      • Received Date: 2015-08-19

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