Chin. J. Semicond. > Volume 10 > Issue 1 > Article Number: 24

Pt-Si界面的椭偏光谱响应及PtSi的光学性质

陈土培 and 黄炳忠

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Abstract: 本工作利用椭偏光谱法研究Pt-Si系统的界面状况,结果指出,未经任何热处理的Pt/n-Si样品的界面上存在着一性质上异于Si衬底和Pt膜的界面层,但经700℃退火(固相反应)形成硅化物PtSi后,原来的界面层消失.另外,由椭偏光谱测量,本工作获得了PtSi薄膜的光学性质,这些光学性质可由Lorentz-Drude模型而得到比较好的解释,该模型包含了三项具有不同的共振能量的束缚电子项及一项自由电子项的贡献.

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History

Manuscript received: 19 August 2015 Manuscript revised: Online: Published: 01 January 1989

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