| Citation: |
Xu Yang, Wang Fei, Xu Jun, Liu Zhihong, Qian Peixin. Two Kinds of Patterned SiGe Epitaxial Growth Technologies[J]. Journal of Semiconductors, 2006, 27(S1): 389-391.
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Xu Y, Wang F, Xu J, Liu Z H, Qian P X. Two Kinds of Patterned SiGe Epitaxial Growth Technologies[J]. Chin. J. Semicond., 2006, 27(13): 389.
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Two Kinds of Patterned SiGe Epitaxial Growth Technologies
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Abstract
We lucubrate on the patterned SiGe epitaxial growth technology based on Tsinghua’s UHV/CVD system.We develop different applied technologies of the patterned SiGe epitaxial growth by using the SiO2 single-film or SiO2/Poly-Si double-film as the patterned-window isolated layer.-
Keywords:
- patterned epitaxial growth,
- SiGe,
- UHV/CVD
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References
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Proportional views
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