The characteristics of TDDB (time-dependent dielectric breakdown) and SILC (stress-induced leakage current) for an ultra-thin SiO₂/HfO₂ gate dielectric stack are studied. The EOT (equivalent-oxide-thickness) of the gate stack (Si/SiO₂/HfO₂/TiN/TiAl/TiN/W) is 0.91 nm. The field acceleration factor (γ) extracted in TDDB experiments is 1.59 s·cm/MV, and the maximum voltage is 1.06 V when the devices operate at 125℃ for ten years. A detailed study on the defect generation mechanism induced by SILC is presented to deeply understand the breakdown behavior. The trap energy levels can be calculated by the SILC peaks:one SILC peak is most likely to be caused by the neutral oxygen vacancy (V_O) in the HfO₂ bulk layer at 0.51 eV below the Si conduction band minimum; another SILC peak is induced by the interface traps, which are aligned with the silicon conduction band edge. Furthermore, the great difference between the two SILC peaks demonstrates that the degeneration of the high-k layer dominates the breakdown behavior of the extremely thin gate dielectric.

Currently, the global 5G network, cloud computing, and data center industries are experiencing rapid development. The continuous growth of data center traffic has driven the vigorous progress in high-speed optical transceivers for optical interconnection within data centers. The electro-absorption modulated laser (EML), which is widely used in optical fiber communications, data centers, and high-speed data transmission systems, represents a high-performance photoelectric conversion device. Compared to traditional directly modulated lasers (DMLs), EMLs demonstrate lower frequency chirp and higher modulation bandwidth, enabling support for higher data rates and longer transmission distances. This article introduces the composition, working principles, manufacturing processes, and applications of EMLs. It reviews the progress on advanced indium phosphide (InP)-based EML devices from research institutions worldwide, while summarizing and comparing data transmission rates and key technical approaches across various studies.

In this paper, a high-gain inductorless LNA (low-noise amplifier) compatible with multiple communication protocols from 0.1 to 5.1 GHz is proposed. A composite resistor−capacitor feedback structure is employed to achieve a wide bandwidth matching range and good gain flatness. A second stage with a Darlington pair is used to increase the overall gain of the amplifier, while the gain of the first stage is reduced to reduce the overall noise. The amplifier is based on a 0.25 μm SiGe BiCMOS process, and thanks to the inductorless circuit structure, the core circuit area is only 0.03 mm². Test results show that the lowest noise figure (NF) in the operating band is 1.99 dB, the power gain reaches 29.7 dB, the S₁₁ and S₂₂ are less than −10 dB, the S₁₂ is less than −30 dB, the IIP3 is 0.81dBm, and the OP_1dB is 10.27 dBm. The operating current is 31.18 mA at 3.8 V supply.

The finding of the robust ferroelectricity in HfO₂-based thin films is fantastic from the view point of both the fundamentals and the applications. In this review article, the current research status of the future prospects for the ferroelectric HfO₂-based thin films and devices are presented from fundamentals to applications. The related issues are discussed, which include: 1) The ferroelectric characteristics observed in HfO₂-based films and devices associated with the factors of dopant, strain, interface, thickness, defect, fabrication condition, and more; 2) physical understanding on the observed ferroelectric behaviors by the density functional theory (DFT)-based theory calculations; 3) the characterizations of microscopic and macroscopic features by transmission electron microscopes-based and electrical properties-based techniques; 4) modeling and simulations, 5) the performance optimizations, and 6) the applications of some ferroelectric-based devices such as ferroelectric random access memory, ferroelectric-based field effect transistors, and the ferroelectric tunnel junction for the novel information processing systems.

The formation of an electric dipole at the high-k/SiO₂ interface is quantitatively analyzed. The band lineups and physical origin of dipole formation at the high-k/SiO₂ interface are explained by the dielectric contact induced gap states (DCIGS). The charge neutrality level (CNL) of the DCIGS, which represents a distribution of high-k and SiO₂ contact induced gap states, is utilized to study the dipole moment. The charge transfer due to different CNLs of high-k and SiO₂ is considered as the dominant origin of dipole formation. The theoretically calculated dipole strengths of high-k/SiO₂ systems based on this model are in good agreement with the experimental data.

Ex situ characterization techniques in molecular beam epitaxy (MBE) have inherent limitations, such as being prone to sample contamination and unstable surfaces during sample transfer from the MBE chamber. In recent years, the need for improved accuracy and reliability in measurement has driven the increasing adoption of in situ characterization techniques. These techniques, such as reflection high-energy electron diffraction, scanning tunneling microscopy, and X-ray photoelectron spectroscopy, allow direct observation of film growth processes in real time without exposing the sample to air, hence offering insights into the growth mechanisms of epitaxial films with controlled properties. By combining multiple in situ characterization techniques with MBE, researchers can better understand film growth processes, realizing novel materials with customized properties and extensive applications. This review aims to overview the benefits and achievements of in situ characterization techniques in MBE and their applications for material science research. In addition, through further analysis of these techniques regarding their challenges and potential solutions, particularly highlighting the assistance of machine learning to correlate in situ characterization with other material information, we hope to provide a guideline for future efforts in the development of novel monitoring and control schemes for MBE growth processes with improved material properties.

Aluminum scandium nitride (AlScN), an emerging Ⅲ-nitride semiconductor material, has attracted significant attention in recent years due to its exceptional piezoelectric properties, high thermal stability, tunable bandgap, and excellent compatibility with micro/nano fabrication. This paper systematically reviews the crystal structure, fundamental properties, and property modulation mechanisms of AlScN. It also summarizes recent progress in micro/nano fabrication technologies, including deposition, etching, and device integration. Furthermore, the applications of AlScN in diverse fields such as micro-electromechanical systems (MEMS), RF communications, energy conversion, optoelectronics and sensors are discussed. Finally, current challenges and promising future research directions for AlScN are outlined.

Memristors are now becoming a prominent candidate to serve as the building blocks of non-von Neumann in-memory computing architectures. By mapping analog numerical matrices into memristor crossbar arrays, efficient multiply accumulate operations can be performed in a massively parallel fashion using the physics mechanisms of Ohm’s law and Kirchhoff’s law. In this brief review, we present the recent progress in two niche applications: neural network accelerators and numerical computing units, mainly focusing on the advances in hardware demonstrations. The former one is regarded as soft computing since it can tolerant some degree of the device and array imperfections. The acceleration of multiple layer perceptrons, convolutional neural networks, generative adversarial networks, and long short-term memory neural networks are described. The latter one is hard computing because the solving of numerical problems requires high-precision devices. Several breakthroughs in memristive equation solvers with improved computation accuracies are highlighted. Besides, other nonvolatile devices with the capability of analog computing are also briefly introduced. Finally, we conclude the review with discussions on the challenges and opportunities for future research toward realizing memristive analog computing machines.