Mode-division multiplexing (MDM) has become an increasingly important technology to further increase the transmission capacity of both optical-fiber-based communication networks, data centers and waveguide-based on-chip optical interconnects. Mode manipulation devices are indispensable in MDM system and have been widely studied in fiber, planar lightwave circuits, and silicon and InP based platforms. InP-based integration technology provides the easiest accessibility to bring together the functions of laser sources, modulators, and mode manipulation devices into a single chip, making it a promising solution for fully integrated few-mode transmitters in the MDM system. This paper reviews the recent progress in InP-based mode manipulation devices, including the few-mode converters, multiplexers, demultiplexers, and transmitters. The working principle, structures, and performance of InP-based few-mode devices are discussed.
J. Semicond.Dan Lu, Yiming He, Zhaosong Li, Lingjuan Zhao, Wei Wang. InP-based monolithically integrated few-mode devices[J]. Journal of Semiconductors, 2018, 39(10): 101001. doi: 10.1088/1674-4926/39/10/101001.
D Lu, Y M He, Z S Li, L J Zhao, W Wang, InP-based monolithically integrated few-mode devices[J]. J. Semicond., 2018, 39(10): 101001. doi: 10.1088/1674-4926/39/10/101001.Export: BibTex EndNote
A review: crystalline silicon membranes over sealed cavities for pressure sensors by using silicon migration technology
J. Semicond. 2018, 39 (7): 071005Jiale Su, Xinwei Zhang, Guoping Zhou, Changfeng Xia, Wuqing Zhou, Qing\'an Huang. A review: crystalline silicon membranes over sealed cavities for pressure sensors by using silicon migration technology[J]. Journal of Semiconductors, 2018, 39(7): 071005. doi: 10.1088/1674-4926/39/7/071005.
J L Su, X W Zhang, G P Zhou, C F Xia, W Q Zhou, Q A Huang, A review: crystalline silicon membranes over sealed cavities for pressure sensors by using silicon migration technology[J]. J. Semicond., 2018, 39(7): 071005. doi: 10.1088/1674-4926/39/7/071005.Export: BibTex EndNote
A silicon pressure sensor is one of the very first MEMS components appearing in the microsystem area. The market for the MEMS pressure sensor is rapidly growing due to consumer electronic applications in recent years. Requirements of the pressure sensors with low cost, low power consumption and high accuracy drive one to develop a novel technology. This paper first overviews the historical development of the absolute pressure sensor briefly. It then reviews the state of the art technology for fabricating crystalline silicon membranes over sealed cavities by using the silicon migration technology in detail. By using only one lithographic step, the membranes defined in lateral and vertical dimensions can be realized by the technology. Finally, applications of MEMS through using the silicon migration technology are summarized.
J. Semicond. 2018, 39 (2): 021001Bo Zhang, Wentong Zhang, Ming Qiao, Zhenya Zhan, Zhaoji Li. Concept and design of super junction devices[J]. Journal of Semiconductors, 2018, 39(2): 021001. doi: 10.1088/1674-4926/39/2/021001.
B Zhang, W T Zhang, M Qiao, Z Y Zhan, Z J Li. Concept and design of super junction devices[J]. J. Semicond., 2018, 39(2): 021001. doi: 10.1088/1674-4926/39/2/021001.Export: BibTex EndNote
The super junction (SJ) has been recognized as the " milestone” of the power MOSFET, which is the most important innovation concept of the voltage-sustaining layer (VSL). The basic structure of the SJ is a typical junction-type VSL (J-VSL) with the periodic N and P regions. However, the conventional VSL is a typical resistance-type VSL (R-VSL) with only an N or P region. It is a qualitative change of the VSL from the R-VSL to the J-VSL, introducing the bulk depletion to increase the doping concentration and optimize the bulk electric field of the SJ. This paper firstly summarizes the development of the SJ, and then the optimization theory of the SJ is discussed for both the vertical and the lateral devices, including the non-full depletion mode, the minimum specific on-resistance optimization method and the equivalent substrate model. The SJ concept breaks the conventional " silicon limit” relationship of Ron∝VB2.5, showing a quasi-linear relationship of Ron∝VB1.03.
J. Semicond. 2017, 38 (12): 121001Zeping Zhao, Jianguo Liu, Yu Liu, Ninghua Zhu. High-speed photodetectors in optical communication system[J]. Journal of Semiconductors, 2017, 38(12): 121001. doi: 10.1088/1674-4926/38/12/121001.
Z P Zhao, J G Liu, Y Liu, N H Zhu. High-speed photodetectors in optical communication system[J]. J. Semicond., 2017, 38(12): 121001. doi: 10.1088/1674-4926/38/12/121001.Export: BibTex EndNote
This paper presents a review and discussion for high-speed photodetectors and their applications on optical communications and microwave photonics. A detailed and comprehensive demonstration of high-speed photodetectors from development history, research hotspots to packaging technologies is provided to the best of our knowledge. A few typical applications based on photodetectors are also illustrated, such as free-space optical communications, radio over fiber and millimeter terahertz signal generation systems.
J. Semicond. 2017, 38 (11): 111001Yujia Zhang, Haiyang Wang, Lei Zhang, Xiaomeng Chen, Yu Guo, Huabin Sun, Yun Li. Field-effect transistor memories based on ferroelectric polymers[J]. Journal of Semiconductors, 2017, 38(11): 111001. doi: 10.1088/1674-4926/38/11/111001.
Y J Zhang, H Y Wang, L Zhang, X M Chen, Y Guo, H B Sun, Y Li. Field-effect transistor memories based on ferroelectric polymers[J]. J. Semicond., 2017, 38(11): 111001. doi: 10.1088/1674-4926/38/11/111001.Export: BibTex EndNote
Field-effect transistors based on ferroelectrics have attracted intensive interests, because of their non-volatile data retention, rewritability, and non-destructive read-out. In particular, polymeric materials that possess ferroelectric properties are promising for the fabrications of memory devices with high performance, low cost, and large-area manufacturing, by virtue of their good solubility, low-temperature processability, and good chemical stability. In this review, we discuss the material characteristics of ferroelectric polymers, providing an update on the current development of ferroelectric field-effect transistors (Fe-FETs) in non-volatile memory applications.
J. Semicond. 2017, 38 (7): 071002Dongbin Zhu, Yi Li, Wensheng Shen, Zheng Zhou, Lifeng Liu, Xing Zhang. Resistive random access memory and its applications in storage and nonvolatile logic[J]. Journal of Semiconductors, 2017, 38(7): 071002. doi: 10.1088/1674-4926/38/7/071002.
D B Zhu, Y Li, W S Shen, Z Zhou, L F Liu, X Zhang. Resistive random access memory and its applications in storage and nonvolatile logic[J]. J. Semicond., 2017, 38(7): 071002. doi: 10.1088/1674-4926/38/7/071002.Export: BibTex EndNote
The resistive random access memory (RRAM) device has been widely studied due to its excellent memory characteristics and great application potential in different fields. In this paper, resistive switching materials, switching mechanism, and memory characteristics of RRAM are discussed. Recent research progress of RRAM in high-density storage and nonvolatile logic application are addressed. Technological trends are also discussed.
J. Semicond. 2016, 37 (11): 111001Lingrong Jiang, Jianping Liu, Aiqin Tian, Yang Cheng, Zengcheng Li, Liqun Zhang, Shuming Zhang, Deyao Li, M. Ikeda, Hui Yang. GaN-based green laser diodes[J]. Journal of Semiconductors, 2016, 37(11): 111001. doi: 10.1088/1674-4926/37/11/111001.
L R Jiang, J P Liu, A Q Tian, Y Cheng, Z C Li, L Q Zhang, S M Zhang, D Y Li,M. Ikeda, H Yang. GaN-based green laser diodes[J]. J. Semicond., 2016, 37(11): 111001. doi: 10.1088/1674-4926/37/11/111001.Export: BibTex EndNote
Recently, many groups have focused on the development of GaN-based green LDs to meet the demand for laser display. Great progresses have been achieved in the past few years even that many challenges exist. In this article, we analysis the challenges to develop GaN-based green LDs, and then the approaches to improve the green LD structure in the aspect of crystalline quality, electrical properties, and epitaxial layer structure are reviewed, especially the work we have done.
J. Semicond. 2016, 37 (10): 101001Yunhong Hou, Meng Zhang, Guowei Han, Chaowei Si, Yongmei Zhao, Jin Ning. A review:aluminum nitride MEMS contour-mode resonator[J]. Journal of Semiconductors, 2016, 37(10): 101001. doi: 10.1088/1674-4926/37/10/101001.
Y H Hou, M Zhang, G W Han, C W Si, Y M Zhao, J Ning. A review:aluminum nitride MEMS contour-mode resonator[J]. J. Semicond., 2016, 37(10): 101001. doi: 10.1088/1674-4926/37/10/101001.Export: BibTex EndNote
Over the past several decades, the technology of micro-electromechanical system (MEMS) has advanced. A clear need of miniaturization and integration of electronics components has had new solutions for the next generation of wireless communications. The aluminum nitride (AlN) MEMS contour-mode resonator (CMR) has emerged and become promising and competitive due to the advantages of the small size, high quality factor and frequency, low resistance, compatibility with integrated circuit (IC) technology, and the ability of integrating multi-frequency devices on a single chip. In this article, a comprehensive review of AlN MEMS CMR technology will be presented, including its basic working principle, main structures, fabrication processes, and methods of performance optimization. Among these, the deposition and etching process of the AlN film will be specially emphasized and recent advances in various performance optimization methods of the CMR will be given through specific examples which are mainly focused on temperature compensation and reducing anchor losses. This review will conclude with an assessment of the challenges and future trends of the CMR.
J. Semicond. 2016, 37 (9): 091001Zheng Lou, Zhongzhu Liang, Guozhen Shen. Photodetectors based on two dimensional materials[J]. Journal of Semiconductors, 2016, 37(9): 091001. doi: 10.1088/1674-4926/37/9/091001.
Z Lou, Z Z Liang, G Z Shen. Photodetectors based on two dimensional materials[J]. J. Semicond., 2016, 37(9): 091001. doi: 10.1088/1674-4926/37/9/091001.Export: BibTex EndNote
Two-dimensional (2D) materials with unique properties have received a great deal of attention in recent years. This family of materials has rapidly established themselves as intriguing building blocks for versatile nanoelectronic devices that offer promising potential for use in next generation optoelectronics, such as photodetectors. Furthermore, their optoelectronic performance can be adjusted by varying the number of layers. They have demonstrated excellent light absorption, enabling ultrafast and ultrasensitive detection of light in photodetectors, especially in their single-layer structure. Moreover, due to their atomic thickness, outstanding mechanical flexibility, and large breaking strength, these materials have been of great interest for use in flexible devices and strain engineering. Toward that end, several kinds of photodetectors based on 2D materials have been reported. Here, we present a review of the state-of-the-art in photodetectors based on graphene and other 2D materials, such as the graphene, transition metal dichalcogenides, and so on.
J. Semicond. 2016, 37 (8): 081001Buwen Cheng, Cheng Li, Zhi Liu, Chunlai Xue. Research progress of Si-based germanium materials and devices[J]. Journal of Semiconductors, 2016, 37(8): 081001. doi: 10.1088/1674-4926/37/8/081001.
B W Cheng, C Li, Z Liu, C L Xue. Research progress of Si-based germanium materials and devices[J]. J. Semicond., 2016, 37(8): 081001. doi: 10.1088/1674-4926/37/8/081001.Export: BibTex EndNote
Si-based germanium is considered to be a promising platform for the integration of electronic and photonic devices due to its high carrier mobility, good optical properties, and compatibility with Si CMOS technology. However, some great challenges have to be confronted, such as: (1) the nature of indirect band gap of Ge; (2) the epitaxy of dislocation-free Ge layers on Si substrate; and (3) the immature technology for Ge devices. The aim of this paper is to give a review of the recent progress made in the field of epitaxy and optical properties of Ge heterostructures on Si substrate, as well as some key technologies on Ge devices. High crystal quality Ge epilayers, as well as Ge/SiGe multiple quantum wells with high Ge content, were successfully grown on Si substrate with a low-temperature Ge buffer layer. A local Ge condensation technique was proposed to prepare germanium-on-insulator (GOI) materials with high tensile strain for enhanced Ge direct band photoluminescence. The advances in formation of Ge n+p shallow junctions and the modulation of Schottky barrier height of metal/Ge contacts were a significant progress in Ge technology. Finally, the progress of Si-based Ge light emitters, photodetectors, and MOSFETs was briefly introduced. These results show that Si-based Ge heterostructure materials are promising for use in the next-generation of integrated circuits and optoelectronic circuits.
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